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Keywords:

  • surface enhanced raman spectroscopy;
  • substrate fabrication;
  • maskless reactive ion etching;
  • leaning silicon nanopillars;
  • hot spots
Thumbnail image of graphical abstract

M. S. Schmidt et al. describe on page OP11 a simple, two-step fabrication process to as-semble flexible, freestanding nanopillars into large-area substrates. These substrates can be made using readily available silicon-processing equipment and are suitable for SERS, having a large, uniform Raman enhancement.