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Solvent-Assisted Directed Self-Assembly of Spherical Microdomain Block Copolymers to High Areal Density Arrays

Authors

  • Weiyin Gu,

    1. Department of Polymer Science and Engineering, 120 Governors Drive, University of Massachusetts, Amherst, MA 01003, USA
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  • Ji Xu,

    1. Department of Polymer Science and Engineering, 120 Governors Drive, University of Massachusetts, Amherst, MA 01003, USA
    Current affiliation:
    1. Globalfoundries, 257 Fuller Rd., NFS Suite 380, Albany, NY 12203, USA
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  • Jung-Keun Kim,

    1. Department of Polymer Science and Engineering, 120 Governors Drive, University of Massachusetts, Amherst, MA 01003, USA
    Current affiliation:
    1. Corporate R&D, LG Chem, Ltd., Research Park,104-1 Moonji-dong, Yuseong-gu, Daejeon 305-380, Republic of Korea.
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  • Sung Woo Hong,

    1. Department of Polymer Science and Engineering, 120 Governors Drive, University of Massachusetts, Amherst, MA 01003, USA
    Current affiliation:
    1. Samsung Advanced Institute of Technology (SAIT), Mt. 14-1, Nongseo-dong, Giheung-gu, Yongin-si, Gyeonggi-do 446-712, Republic of Korea
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  • Xinyu Wei,

    1. Department of Polymer Science and Engineering, 120 Governors Drive, University of Massachusetts, Amherst, MA 01003, USA
    Current affiliation:
    1. Cytec Industries, 1937 West Main St, Stamford, CT 06902, USA
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  • Xiaomin Yang,

    1. Seagate Technology, LLD. 47010 Kato Road, Fremont, CA 94538, USA
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  • Kim Y. Lee,

    1. Seagate Technology, LLD. 47010 Kato Road, Fremont, CA 94538, USA
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  • David S. Kuo,

    1. Seagate Technology, LLD. 47010 Kato Road, Fremont, CA 94538, USA
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  • Shuaigang Xiao,

    Corresponding author
    1. Seagate Technology, LLD. 47010 Kato Road, Fremont, CA 94538, USA
    • Seagate Technology, LLD. 47010 Kato Road, Fremont, CA 94538, USA.
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  • Thomas P. Russell

    Corresponding author
    1. Department of Polymer Science and Engineering, 120 Governors Drive, University of Massachusetts, Amherst, MA 01003, USA
    • Department of Polymer Science and Engineering, 120 Governors Drive, University of Massachusetts, Amherst, MA 01003, USA
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Abstract

original image

The fabrication process for 5 Tb/in2 bit patterns using solvent-assisted directed self-assembly is investigated. The N-methyl-2-pyrrolidone solvent vapor-annealing method was used to achieve good long-range lateral ordering of low-molecular-weight polystyrene-block-polydimethylsiloxane with a lattice spacing of 11 nm on flat Si substrates, PS modified substrates and lithographically patterned substrates, respectively.

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