Present address: Mechanobiology Institute (MBI), National University of Singapore, 5A Engineering Drive 1, Singapore 117411
Novel Hybrid Organic–Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching
Article first published online: 5 AUG 2013
© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 25, Issue 43, pages 6261–6265, November 20, 2013
How to Cite
Zanchetta, E., Giustina, G. D., Grenci, G., Pozzato, A., Tormen, M. and Brusatin, G. (2013), Novel Hybrid Organic–Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching. Adv. Mater., 25: 6261–6265. doi: 10.1002/adma.201301555
- Issue published online: 18 NOV 2013
- Article first published online: 5 AUG 2013
- Manuscript Received: 13 APR 2013
Vol. 26, Issue 5, 674, Article first published online: 3 FEB 2014
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