Advanced Materials

Non-Porous Low-k Dielectric Films Based on a New Structural Amorphous Fluoropolymer

Authors

  • Chao Yuan,

    1. Key Laboratory of Organofluorine Chemistry and Laboratory for Polymer Materials, Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences, 345 Lingling Road, Shanghai 200032, P.R. China
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  • Kaikai Jin,

    1. Key Laboratory of Organofluorine Chemistry and Laboratory for Polymer Materials, Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences, 345 Lingling Road, Shanghai 200032, P.R. China
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  • Kai Li,

    1. Key Laboratory of Organofluorine Chemistry and Laboratory for Polymer Materials, Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences, 345 Lingling Road, Shanghai 200032, P.R. China
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  • Shen Diao,

    1. Key Laboratory of Organofluorine Chemistry and Laboratory for Polymer Materials, Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences, 345 Lingling Road, Shanghai 200032, P.R. China
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  • Jiawei Tong,

    1. Key Laboratory of Organofluorine Chemistry and Laboratory for Polymer Materials, Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences, 345 Lingling Road, Shanghai 200032, P.R. China
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  • Qiang Fang

    Corresponding author
    1. Key Laboratory of Organofluorine Chemistry and Laboratory for Polymer Materials, Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences, 345 Lingling Road, Shanghai 200032, P.R. China
    • Key Laboratory of Organofluorine Chemistry and Laboratory for Polymer Materials, Shanghai Institute of Organic Chemistry, Chinese Academy of Sciences, 345 Lingling Road, Shanghai 200032, P.R. China.
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Abstract

A non-porous and amorphous fluoropolymer PFN with low dielectric constant of 2.33 and dielectric loss less than 1.2 × 10−3 is reported here. PFN also exhibits good mechanical properties and high thermostability. This study is a new example of a fully dense material showing a low k value and having good thermo/mechanical properties.

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