Novel Hybrid Organic-Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching

Authors

  • Erika Zanchetta,

  • Gioia Della Giustina,

  • Gianluca Grenci,

  • Alessandro Pozzato,

  • Massimo Tormen,

  • Giovanna Brusatin

Errata

This article corrects:

  1. Novel Hybrid Organic–Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching Volume 25, Issue 43, 6261–6265, Article first published online: 5 August 2013

No abstract is available for this article.

Ancillary