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Advanced Materials

Complex Dynamic Substrate Control: Dual-Tone Hydrogel Photoresists Allow Double-Dissociation of Topography and Modulus



Complex substrate control is demonstrated with a dual-tone hydrogel photoresist. By exposing a photodegradable hydrogel to UV light through a photomask, both swollen and eroded micropatterns with a decreased modulus can be created on the surface under different exposure conditions. This provides an important tool for investigating the synergistic effects of spatially heterogeneous mechanical and topological cues on cell behavior.

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