Thin Films: Organic Vapor Passivation of Silicon at Room Temperature (Adv. Mater. 14/2013)

Authors

  • Rong Yang,

    1. Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA
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  • Tonio Buonassisi,

    1. Department of Mechanical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA
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  • Karen K. Gleason

    Corresponding author
    1. Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA
    • Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA.
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Abstract

original image

Initiated chemical vapor deposition is used to achieve air-stable organic passivation of silicon, as reported by Karen K. Gleason and co-workers on page 2078. This layer also functions as an anti-reflection coating. Resistively heated wires produce reactive gas phase species, including methyl radicals, while the silicon surface below remains near room temperature. Photoshop enhanced image by Felice C. Frankel.

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