Polyurethane thin films that photopolymerize and photodegrade upon exposure to light of different wavelengths are presented. The chromic response is based on two caged monomers with the ability to be activated or photocleaved with different wavelengths under single and two-photon excitation. This material represents a dual photoresist with “positive” and “negative” tone contained in a single resist formulation and with the ability to generate complex 2D and 3D patterns.
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