Advanced Materials

Hierarchical Patterns: Harnessing Localized Ridges for High-Aspect-Ratio Hierarchical Patterns with Dynamic Tunability and Multifunctionality (Adv. Mater. 11/2014)

Authors

  • Changyong Cao,

    1. Soft Active Materials Laboratory, Department of Mechanical Engineering and Materials Science, Duke University, Durham, NC, USA
    2. Research School of Engineering, Australian National University, Canberra, ACT, Australia
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  • Hon Fai Chan,

    1. Department of Biomedical Engineering, Duke University, Durham, NC, USA
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  • Jianfeng Zang,

    1. Soft Active Materials Laboratory, Department of Mechanical Engineering and Materials Science, Duke University, Durham, NC, USA
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  • Kam W. Leong,

    1. Department of Biomedical Engineering, Duke University, Durham, NC, USA
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  • Xuanhe Zhao

    Corresponding author
    1. Soft Active Materials Laboratory, Department of Mechanical Engineering and Materials Science, Duke University, Durham, NC, USA
    • Soft Active Materials Laboratory, Department of Mechanical Engineering and Materials Science, Duke University, Durham NC 27708 USA

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Abstract

A simple yet effective method, described on page 1763 by X. Zhao and co-workers, to generate high-aspect-ratio, hierarchical, and dynamically tunable topographical patterns over large areas by harnessing the localized-ridge instability in nanofilms. The new patterns have led to extraordinary functions, including extremely stretchable super-hydrophobic coatings and biomimetic cell-culture substrates capable of controlled stem-cell alignment on demand.

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