Functional Surfaces: Biologically Inspired Omniphobic Surfaces by Reverse Imprint Lithography (Adv. Mater. 13/2014)

Authors

  • René Hensel,

    1. Max Bergmann Center of Biomaterials Dresden, Leibniz Institute of Polymer Research Dresden, Dresden, Germany
    2. Technische Universität Dresden, Research Training Group “Nano- and Biotechniques for Electronic Device Packaging”, Dresden, Germany
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  • Andreas Finn,

    1. Technische Universität Dresden, Institute of Semiconductors and Microsystems, Dresden, Germany
    2. Technische Universität Dresden, Research Training Group “Nano- and Biotechniques for Electronic Device Packaging”, Dresden, Germany
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  • Ralf Helbig,

    1. Max Bergmann Center of Biomaterials Dresden, Leibniz Institute of Polymer Research Dresden, Dresden, Germany
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  • Hans-Georg Braun,

    1. Max Bergmann Center of Biomaterials Dresden, Leibniz Institute of Polymer Research Dresden, Dresden, Germany
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  • Christoph Neinhuis,

    1. Technische Universität Dresden, Institute of Botany, Dresden, Germany
    2. Technische Universität Dresden, B CUBE Innovation Center for Molecular Bioengineering, Dresden, Germany
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  • Wolf-Joachim Fischer,

    1. Technische Universität Dresden, Institute of Semiconductors and Microsystems, Dresden, Germany
    2. Technische Universität Dresden, Research Training Group “Nano- and Biotechniques for Electronic Device Packaging”, Dresden, Germany
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  • Carsten Werner

    Corresponding author
    1. Max Bergmann Center of Biomaterials Dresden, Leibniz Institute of Polymer Research Dresden, Dresden, Germany
    2. Technische Universität Dresden, B CUBE Innovation Center for Molecular Bioengineering, Dresden, Germany
    3. Technische Universität Dresden, Research Training Group “Nano- and Biotechniques for Electronic Device Packaging”, Dresden, Germany
    • Max Bergmann Center of Biomaterials Dresden, Leibniz Institute of Polymer Research Dresden, Hohe Straße 6, 01069 Dresden Germany

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Abstract

image

A springtail skin morphology is translated into omniphobic polymer membranes by reverse imprint lithography, as described by C. Werner and co-workers on page 2029. The characteristic overhanging structures are arranged in a selfsupporting comblike pattern which provides mechanical stability.

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