Direct Writing of Patterned Ceramics Using Electron-Beam Lithography and Metallopolymer Resists (pages 215–219)
S. B. Clendenning, S. Aouba, M. S. Rayat, D. Grozea, J. B. Sorge, P. M. Brodersen, R. N. S. Sodhi, Z.-H. Lu, C. M. Yip, M. R. Freeman, H. E. Ruda and I. Manners
Article first published online: 11 FEB 2004 | DOI: 10.1002/adma.200305740
Patterned arrays of ceramics have been fabricated using electron-beam lithography (EBL) and a metallopolymer resist. Highly ordered arrays of dots, bars (see scanning electron microscopy and time-of-flight secondary ion mass spectrometry images in the Figure), and curved lines rich in Fe and Co are direct-written on films of a highly metallized cobalt-clusterized polyferrocenylsilane. Subsequent pyrolysis leads to ferromagnetic ceramics.