Magnetic Ceramic Films from a Metallopolymer Resist Using Reactive Ion Etching in a Secondary Magnetic Field (pages 291–296)
S. B. Clendenning, S. Han, N. Coombs, C. Paquet, M. S. Rayat, D. Grozea, P. M. Brodersen, R. N. S. Sodhi, C. M. Yip, Z.-H. Lu and I. Manners
Version of Record online: 26 FEB 2004 | DOI: 10.1002/adma.200306262
Magnetic ceramic films containing metal-rich nanoworm reticulations 200–550 nm wide have been fabricated from a highly metallized metallopolymer resist (see Figure) using oxygen or hydrogen plasma reactive ion etching in a secondary magnetic field. Applications may be found in spintronics and logic circuits.