The Patterning of Sub-500 nm Inorganic Oxide Structures (pages 2667–2673)
Meredith J. Hampton, Stuart S. Williams, Zhilian Zhou, Janine Nunes, Doo-Hyun Ko, Joseph L. Templeton, Edward T. Samulski and Joseph M. DeSimone
Article first published online: 2 JUN 2008 | DOI: 10.1002/adma.200702495
Elastomeric perfluoropolyether molds are applied to pattern arrays of sub-500 nm inorganic oxide features. This versatile soft-lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including TiO2, SnO2, ZnO, ITO, and BaTiO3 are patterned on a variety of substrates with different aspect ratios. An example of TiO2 posts is shown in the figure.