Al2O3/ZrO2 Nanolaminates as Ultrahigh Gas-Diffusion Barriers—A Strategy for Reliable Encapsulation of Organic Electronics (pages 1845–1849)
Jens Meyer, Patrick Görrn, Franz Bertram, Sami Hamwi, Thomas Winkler, Hans-Hermann Johannes, Thomas Weimann, Peter Hinze, Thomas Riedl and Wolfgang Kowalsky
Version of Record online: 19 FEB 2009 | DOI: 10.1002/adma.200803440
Highly efficient gas-diffusion barriers based on nanolaminates of alternating Al2O3 and ZrO2 layers grown at 80 °C by atomic-layer deposition are presented. Ultralow water-vapor permeation rates are reported, and a dramatic reduction of statistical defects on larger areas was found compared to single Al2O3 layers. This study provides a concept for the encapsulation of organic optoelectronic devices.