Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films (pages 1993–2027)
Mahriah E. Alf, Ayse Asatekin, Miles C. Barr, Salmaan H. Baxamusa, Hitesh Chelawat, Gozde Ozaydin-Ince, Christy D. Petruczok, Ramaswamy Sreenivasan, Wyatt E. Tenhaeff, Nathan J. Trujillo, Sreeram Vaddiraju, Jingjing Xu and Karen K. Gleason
Article first published online: 4 DEC 2009 | DOI: 10.1002/adma.200902765
Chemical vapor deposition (CVD) polymerization bridges all-dry microfabrication technology with the chemistry of functional and responsive organic materials. In a single step, vapor-phase monomers can be transformed through selective reaction for surface modification of micro- and nanostructured surfaces. Shown is conformal CVD polymer deposition, ∼350 nm thick, on trenches 7 μm deep and 2 μm wide etched on silicon.