High-Pressure Chemical Deposition for Void-Free Filling of Extreme Aspect Ratio Templates (pages 4605–4611)
Neil F. Baril, Banafsheh Keshavarzi, Justin R. Sparks, Mahesh Krishnamurthi, Ivan Temnykh, Pier J. A. Sazio, Anna C. Peacock, Ali Borhan, Venkatraman Gopalan and John V. Badding
Article first published online: 8 SEP 2010 | DOI: 10.1002/adma.201001199
Near atomically smooth, void-free, centimeter-long amorphous silicon waveguides are produced by high pressure chemical fluid deposition in the pores of a microstructured optical fiber template (right inset). Semiconductor waveguides fabricated by conventional deposition/fabrication approaches have a surface roughness that is a constraining factor in most optoelectronic devices, but these waveguides conform to the extraordinarily geometrically perfect optical fiber pores (DIC image, bottom inset).