Enhancement of Ferroelectric Polarization Stability by Interface Engineering (pages 1209–1216)
H. Lu, X. Liu, J. D. Burton, C.-W. Bark, Y. Wang, Y. Zhang, D. J. Kim, A. Stamm, P. Lukashev, D. A. Felker, C. M. Folkman, P. Gao, M. S. Rzchowski, X. Q. Pan, C.-B. Eom, E. Y. Tsymbal and A. Gruverman
Version of Record online: 26 JAN 2012 | DOI: 10.1002/adma.201104398
By using theoretical predictions based on first-principle calculations, we explore an interface engineering approach to stabilize polarization states in ferroelectric heterostructures with a thickness of just several nanometers.