Highly Transparent and Conductive ZnO: Al Thin Films from a Low Temperature Aqueous Solution Approach (pages 632–636)
Harald Hagendorfer, Karla Lienau, Shiro Nishiwaki, Carolin M. Fella, Lukas Kranz, Alexander R. Uhl, Dominik Jaeger, Li Luo, Christina Gretener, Stephan Buecheler, Yaroslav E. Romanyuk and Ayodhya N. Tiwari
Article first published online: 22 OCT 2013 | DOI: 10.1002/adma.201303186
A solution deposition approach for high-performance aluminum-doped zinc oxide (AZO) thin films (visible transparency > 90% and sheet resistance down to 25 Ω/sq) with process temperatures not exceeding 85 °C is presented. This allows the non-vacuum deposition of AZO on temperature sensitive substrates such as polymer films for flexible and transparent electronics, or inorganic and organic thin film photovoltaics.