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Arrays of Arbitrarily Shaped Nanoparticles: Overlay-Errorless Direct Ion Write

Authors

  • Gediminas Gervinskas,

    Corresponding author
    1. The Australian National Fabrication Facility – ANFF, Victoria node, Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, Hawthorn, VIC, Australia
    • Centre for Micro-Photonics, Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, Hawthorn, VIC, Australia
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  • Gediminas Seniutinas,

    1. Centre for Micro-Photonics, Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, Hawthorn, VIC, Australia
    2. The Australian National Fabrication Facility – ANFF, Victoria node, Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, Hawthorn, VIC, Australia
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  • Lorenzo Rosa,

    1. Centre for Micro-Photonics, Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, Hawthorn, VIC, Australia
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  • Saulius Juodkazis

    1. Centre for Micro-Photonics, Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, Hawthorn, VIC, Australia
    2. The Australian National Fabrication Facility – ANFF, Victoria node, Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, Hawthorn, VIC, Australia
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E-mail: GGervinskas@swin.edu.au

Abstract

A simple solution to lithographically write down to 20–30 nm features over micrometer-sized nanoparticle arrays with high fidelity of pattern transfer from the designed to fabricated architectures is shown. It is achieved via a two-step approach: (i) fabrication of basic shape nanoparticles by electron beam lithography, gold deposition via sputtering and lift-off, then (ii) nano-patterning by focused ion beam lithography. Application potential of 3D tailored nanoparticles for nanotweezers is discussed on the basis of numerical modeling and experimental measurements of extinction.

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