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    Min Jae Shin, Young Jae Shin, Jae Sup Shin, Role of fluorinated monomer for simple demolding in nanoimprint lithography, Journal of Applied Polymer Science, 2015, 132, 1
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    Guanghui Lin, Fang Zhang, Qi Zhang, Jie Wei, Jinbao Guo, Fluorinated silsesquioxane-based photoresist as an ideal high-performance material for ultraviolet nanoimprinting, RSC Adv., 2014, 4, 83, 44073

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    Carl Pfeiffer, Cheng Zhang, Vishva Ray, L. Jay Guo, Anthony Grbic, High Performance Bianisotropic Metasurfaces: Asymmetric Transmission of Light, Physical Review Letters, 2014, 113, 2

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