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Highly Efficient Silicon Nanoarray Solar Cells by a Single-Step Plasma-Based Process

Authors

  • S. Xu,

    1. Plasma Sources and Applications Center, NIE, Nanyang Technological University, 1 Nanyang Walk, 637616, Singapore
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  • S. Y Huang,

    1. Plasma Sources and Applications Center, NIE, Nanyang Technological University, 1 Nanyang Walk, 637616, Singapore
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  • I. Levchenko,

    1. Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, P.O. Box 218, Lindfield NSW 2070, Australia, and School of Physics, The University of Sydney, Sydney NSW 2006, Australia
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  • H. P. Zhou,

    1. Plasma Sources and Applications Center, NIE, Nanyang Technological University, 1 Nanyang Walk, 637616, Singapore
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  • D. Y. Wei,

    1. Plasma Sources and Applications Center, NIE, Nanyang Technological University, 1 Nanyang Walk, 637616, Singapore
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  • S. Q. Xiao,

    1. Plasma Sources and Applications Center, NIE, Nanyang Technological University, 1 Nanyang Walk, 637616, Singapore
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  • L. X. Xu,

    1. Plasma Sources and Applications Center, NIE, Nanyang Technological University, 1 Nanyang Walk, 637616, Singapore
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  • W. S. Yan,

    1. Plasma Sources and Applications Center, NIE, Nanyang Technological University, 1 Nanyang Walk, 637616, Singapore
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  • K. Ostrikov

    Corresponding author
    1. Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, P.O. Box 218, Lindfield NSW 2070, Australia, and School of Physics, The University of Sydney, Sydney NSW 2006, Australia
    • Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, P.O. Box 218, Lindfield NSW 2070, Australia, and School of Physics, The University of Sydney, Sydney NSW 2006, Australia.
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Abstract

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Highly efficient solar cells (conversion efficiency 11.9%, fill factor 70%) based on the vertically aligned single-crystalline nanostructures are fabricated without any pre-fabricated p-n junctions in a very simple, single-step process of Si nanoarray formation by etching p-type Si(100) wafers in low-temperature environment-friendly plasmas of argon and hydrogen mixtures.

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