Materials, Interfaces and Electrochemical Phenomena
Removal of moisture contamination from porous polymeric low-k dielectric films
Article first published online: 4 JAN 2006
Copyright © 2006 American Institute of Chemical Engineers (AIChE)
Volume 52, Issue 4, pages 1586–1593, April 2006
How to Cite
Iqbal, A., Juneja, H., Yao, J. and Shadman, F. (2006), Removal of moisture contamination from porous polymeric low-k dielectric films. AIChE J., 52: 1586–1593. doi: 10.1002/aic.10760
- Issue published online: 6 MAR 2006
- Article first published online: 4 JAN 2006
- Manuscript Revised: 23 NOV 2005
- Manuscript Received: 20 SEP 2005
- NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing
Options for accessing this content:
- If you are a society or association member and require assistance with obtaining online access instructions please contact our Journal Customer Services team.
- If your institution does not currently subscribe to this content, please recommend the title to your librarian.
- Login via other institutional login options http://onlinelibrary.wiley.com/login-options.
- You can purchase online access to this Article for a 24-hour period (price varies by title)
- If you already have a Wiley Online Library or Wiley InterScience user account: login above and proceed to purchase the article.
- New Users: Please register, then proceed to purchase the article.
Login via OpenAthens
Search for your institution's name below to login via Shibboleth.
Registered Users please login:
- Access your saved publications, articles and searches
- Manage your email alerts, orders and subscriptions
- Change your contact information, including your password
Please register to:
- Save publications, articles and searches
- Get email alerts
- Get all the benefits mentioned below!