In the production of boron fibres using the chemical vapor deposition (CVD) technique, boron deposition and dichloroborane formation reactions occurs simultaneously. Boron deposition reaction occurs at the surface, whereas the formation of dichloroborane is the result of both gas phase and surface reactions. A continuous stirred tank reactor (CSTR) type of reactor was designed to investigate the reaction kinetics and kinetic parameters in the gas phase reactions of boron trichloride and hydrogen. It was concluded that reaction rate of the product increased with an increase in the inlet concentration of both reactants (BCl3 and H2) and with an increase in the reactor temperature. While reaction order with respect to BCl3 was almost constant at about 0.5 at each temperature, reaction order with respect to hydrogen increased significantly at temperatures lower than 350°C. A general rate expression was derived for BHCl2 formation from BCl3 and hydrogen. © 2011 American Institute of Chemical Engineers AIChE J, 2012
If you can't find a tool you're looking for, please click the link at the top of the page to "Go to old article view". Alternatively, view our Knowledge Base articles for additional help. Your feedback is important to us, so please let us know if you have comments or ideas for improvement.