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Abstract

A galvanostatic pulse plating model is presented for the electrodeposition of an alloy on a rotating disk electrode. This model is used to simulate the electrodeposition of nickel/chrome alloys. The mass transport equations used in the model include the effects of diffusion, migration and convection; and the electrode kinetics are described by the Butler-Volmer equation. It is predicted that the effect of ionic migration is significant and therefore should be included in models of pulse plating.