Process Systems Engineering
Simultaneous optimal bottom linewidth and side-wall curvature control of wet etching
Article first published online: 17 JUN 2004
Copyright © 1996 American Institute of Chemical Engineers
Volume 42, Issue 9, pages 2576–2581, September 1996
How to Cite
Zhou, B. and Ramirez, W. F. (1996), Simultaneous optimal bottom linewidth and side-wall curvature control of wet etching. AIChE J., 42: 2576–2581. doi: 10.1002/aic.690420918
- Issue published online: 17 JUN 2004
- Article first published online: 17 JUN 2004
- Manuscript Revised: 8 FEB 1996
- Manuscript Received: 11 SEP 1995
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