Gas-phase nucleation in the tetraethylorthosilicate (TEOS)/O3 APCVD process
Version of Record online: 17 JUN 2004
Copyright © 1997 American Institute of Chemical Engineers
Supplement: Special Ceramics Processing Issue
Volume 43, Issue Supplement 11A, pages 2688–2697, 1997
How to Cite
Okuyama, K., Fujimoto, T., Hayashi, T. and Adachi, M. (1997), Gas-phase nucleation in the tetraethylorthosilicate (TEOS)/O3 APCVD process. AIChE J., 43: 2688–2697. doi: 10.1002/aic.690431313
- Issue online: 17 JUN 2004
- Version of Record online: 17 JUN 2004
- Manuscript Revised: 5 MAY 1997
- Manuscript Received: 28 OCT 1996
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