Characterization of sputtered BZT thin films for MCM: Multichip module

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Abstract

Ba(Zr, Ti)O3 [BZT] thin films were prepared for potential use as a decoupling capacitor for a multichip module (MCM). The crystal structure of BZT thin films on Pt(100)/MgO(100) and MgO(100) deposited from Ba(Zr0.2Ti0.8)O3 powder targets has a perovskite structure and is strongly (100) oriented. The crystal structure of BZT thin films on Pt(111) coated substrates differ from that of Pt(100)/MgO(100) and MgO(100) substrates. The degree of preferred (100) orientation on Pt(111)/SiO2/Si increased with increasing deposition temperature. We obtained a maximum dielectric constant of 150 at 600°C deposition. The loss tangent, leakage current and temperature dependence of capacitance of these BZT thin films were very small.

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