Excimer laser projection etching of copper foils in chlorine gas
Article first published online: 14 SEP 2004
Copyright © 1992 John Wiley & Sons Ltd.
Advanced Materials for Optics and Electronics
Volume 1, Issue 2, pages 51–57, April 1992
How to Cite
Dyer, P. E., Greenough, R. D. and Key, P. H. (1992), Excimer laser projection etching of copper foils in chlorine gas. Adv. Mater. Opt. Electron., 1: 51–57. doi: 10.1002/amo.860010202
- Issue published online: 14 SEP 2004
- Article first published online: 14 SEP 2004
- Manuscript Accepted: 20 DEC 1991
- Manuscript Received: 14 NOV 1991
Low-fluence XeCl laser etching of copper foils in a chlorine environment has been studied. The etch rate is fluence-dependent in the range 0.05–1.0 J cm−2 and is governed by the growth characteristics of the chloride layer formed in the interpulse period. Projection etching with good pattern reproduction and resolution for high-aspect-ratio features is demonstrated.