Development of lithographic techniques for metallisation of organic substrates
Article first published online: 14 SEP 2004
Copyright © 1992 John Wiley & Sons Ltd.
Advanced Materials for Optics and Electronics
Volume 1, Issue 4, pages 197–201, August 1992
How to Cite
Gilmour, S., Kershaw, S. V., Pethrick, R. A., Pantelis, P., Cassidy, S. and Sherwood, J. N. (1992), Development of lithographic techniques for metallisation of organic substrates. Adv. Mater. Opt. Electron., 1: 197–201. doi: 10.1002/amo.860010406
- Issue published online: 14 SEP 2004
- Article first published online: 14 SEP 2004
- Manuscript Received: 13 APR 1992
- Manuscript Revised: 13 APR 1992
- SAW device;
- Gold/titanium bilayer;
- Shadow masking
A wide range of applications which involve organic crystalline materials require the metallisation of low-molecular-weight compounds. Conventional lithographic techniques used in silicon fabrication technology use high-temperature processing methods which are unsuitable for organic materials. Gold/titanium bilayer and shadow-masking techniques were found to provide suitable solutions to the problem of metallisation of these materials and allowed fabrication of a surface acoustic wave (SAW) device with (–)-2-α-methylbenzylamino-5-nitropyridine (MBANP) as substrate.