A modified plasma source for controlled layer thickness synthesis in laser pulse vapour deposition (LPVD)
Article first published online: 14 SEP 2004
Copyright © 1993 John Wiley & Sons Ltd.
Advanced Materials for Optics and Electronics
Volume 2, Issue 1-2, pages 19–29, February 1993
How to Cite
Dietsch, R., Mai, H., Pompe, W. and Völlmar, S. (1993), A modified plasma source for controlled layer thickness synthesis in laser pulse vapour deposition (LPVD). Adv. Mater. Opt. Electron., 2: 19–29. doi: 10.1002/amo.860020104
- Issue published online: 14 SEP 2004
- Article first published online: 14 SEP 2004
- Manuscript Revised: 11 NOV 1992
- Manuscript Received: 29 JUN 1992
Options for accessing this content:
- Login via other institutional login options http://onlinelibrary.wiley.com/login-options.
- You can purchase online access to this Article for a 24-hour period (price varies by title)
- New Users: Please register, then proceed to purchase the article.
Registered Users please login:
- Access your saved publications, articles and searches
- Manage your email alerts, orders and subscriptions
- Change your contact information, including your password
Please register to:
- Save publications, articles and searches
- Get email alerts
- Get all the benefits mentioned below!