Low-temperature plasma-assisted processes for fabrication of SiO2/Si heterostructures
Article first published online: 14 SEP 2004
Copyright © 1993 John Wiley & Sons Ltd.
Advanced Materials for Optics and Electronics
Volume 2, Issue 1-2, pages 43–51, February 1993
How to Cite
Lucovsky, G. (1993), Low-temperature plasma-assisted processes for fabrication of SiO2/Si heterostructures. Adv. Mater. Opt. Electron., 2: 43–51. doi: 10.1002/amo.860020106
- Issue published online: 14 SEP 2004
- Article first published online: 14 SEP 2004
- Manuscript Revised: 14 DEC 1992
- Manuscript Received: 17 JUN 1992
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