A photolithographic technique for patterning spin-coated polyaniline films

Authors

  • C. Di Bartolomeo,

    1. Molecular Electronics Group, School of Engineering and Computer Science, University of Durham, South Road, Durham DH1 3LE, U.K.
    Current affiliation:
    1. Faculty of Engineering, University of Pisa, Via Diotisalvi 2, I-56100 Pisa, Italy
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  • P. Barker,

    1. Molecular Electronics Group, School of Engineering and Computer Science, University of Durham, South Road, Durham DH1 3LE, U.K.
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    • Also at Organic Electro-active Materials Group, Department of Physics, University of Durham.

  • M. C. Petty,

    1. Molecular Electronics Group, School of Engineering and Computer Science, University of Durham, South Road, Durham DH1 3LE, U.K.
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  • P. Adams,

    1. Organic Electro-active Materials Group, Department of Physics, University of Durham, South Road, Durham DH1 3LE, U.K.
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  • A. P. Monkman

    1. Organic Electro-active Materials Group, Department of Physics, University of Durham, South Road, Durham DH1 3LE, U.K.
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Abstract

Solvent-cast polyaniline films have been deposited by spin coating and photolithographic techniques used to pattern the films to a resolution of 15–20 μm. This approach is then used successfully to deposit the polymer on the gate areas of an array of silicon field effect transistors.

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