Advances of pulsed laser deposition of ZnO thin films
Article first published online: 10 FEB 2004
Copyright © 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Annalen der Physik
Volume 13, Issue 1-2, pages 59–60, January 2004
How to Cite
Lorenz, M., Hochmuth, H., Schmidt-Grund, R., Kaidashev, E.M. and Grundmann, M. (2004), Advances of pulsed laser deposition of ZnO thin films. Ann. Phys., 13: 59–60. doi: 10.1002/andp.200310046
- Issue published online: 10 FEB 2004
- Article first published online: 10 FEB 2004
- Manuscript Accepted: 16 OCT 2003
- Manuscript Received: 11 SEP 2003
- ZnO thin films;
- pulsed laser deposition;
- Bragg resonator;
- depth profiling.
Advances in Pulsed Laser Deposition (PLD) equipment and process design for the epitaxy of ZnO thin films on a-, and c-oriented sapphire substrates are reported. The achieved improvement of device relevant ZnO layer properties is directly related to our equipment design and novel process schemes. First results on growth and reflectivity of ZnO-MgO based dielectric Bragg resonators for future ZnO-based light emitter devices are shown.