High-Resolution Soft Lithography: Enabling Materials for Nanotechnologies

Authors

  • Jason P. Rolland,

    1. Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, NC, 27599, USA
    2. Department of Chemical Engineering, North Carolina State University, Raleigh, NC, 27695, USA, Fax: (+1) 919-962-5467
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  • Erik C. Hagberg,

    1. IBM Almaden Research Center, Center for Polymeric Interfaces and Macromolecular Assemblies, San Jose, CA, 95120, USA, Fax: (+1) 413-545-0082
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  • Ginger M. Denison,

    1. Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, NC, 27599, USA
    2. Department of Chemical Engineering, North Carolina State University, Raleigh, NC, 27695, USA, Fax: (+1) 919-962-5467
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  • Kenneth R. Carter Dr.,

    1. IBM Almaden Research Center, Center for Polymeric Interfaces and Macromolecular Assemblies, San Jose, CA, 95120, USA, Fax: (+1) 413-545-0082
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  • Joseph M. De Simone Prof.

    1. Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, NC, 27599, USA
    2. Department of Chemical Engineering, North Carolina State University, Raleigh, NC, 27695, USA, Fax: (+1) 919-962-5467
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  • We acknowledge partial support from the Office of Naval Research (N000140210185), partial support from the STC program of the National Science Foundation under Agreement No. CHE-9876674 and the William R. Kenan, Jr. Distinguished Professorship for financial support. We gratefully acknowledge Anthony Brennan at the University of Florida for providing the micron-scale master. We also acknowledge partial support from the MRSEC Program of the NSF Materials Science and Engineering Research Center Grant (9808677) to the Center for Polymer Interfaces and Macromolecular Assemblies (CPIMA) at Stanford University.

Abstract

original image

Ein guter Eindruck: Photohärtbare, flüssige Perfluorpolyether (PFPEs) eignen sich ideal für hochauflösende (<100 nm) Musterübertragungs- und lithographische Prägeprozesse (siehe Bild). Die PFPEs weisen Merkmale von Elastomeren wie von steifen Materialien auf, haben eine bemerkenswert niedrige Oberflächenenergie, geben sehr kleine Muster mit großer Genauigkeit wieder, werden durch die meisten organischen Solventien nicht gequollen und lassen sich wiederholt in Gießprozessen einsetzen.

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