We acknowledge partial support from the Office of Naval Research (N000140210185), partial support from the STC program of the National Science Foundation under Agreement No. CHE-9876674 and the William R. Kenan, Jr. Distinguished Professorship for financial support. We gratefully acknowledge Anthony Brennan at the University of Florida for providing the micron-scale master. We also acknowledge partial support from the MRSEC Program of the NSF Materials Science and Engineering Research Center Grant (9808677) to the Center for Polymer Interfaces and Macromolecular Assemblies (CPIMA) at Stanford University.
High-Resolution Soft Lithography: Enabling Materials for Nanotechnologies†
Version of Record online: 11 OCT 2004
Copyright © 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 116, Issue 43, pages 5920–5923, November 5, 2004
How to Cite
Rolland, J. P., Hagberg, E. C., Denison, G. M., Carter, K. R. and De Simone, J. M. (2004), High-Resolution Soft Lithography: Enabling Materials for Nanotechnologies. Angew. Chem., 116: 5920–5923. doi: 10.1002/ange.200461122
- Issue online: 2 NOV 2004
- Version of Record online: 11 OCT 2004
- Manuscript Received: 29 JUN 2004
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