Financial support from the Director, Office of Science, Office of Basic Energy Sciences, the U.S. Department of Energy under contract number DE-AC02-05CH11231, NSF-SINAM, and SRC-DARPA is gratefully acknowledged. M.R. thanks INTEL for postdoctoral funding through the Materials Sciences Division, LBNL. The authors thank Dr. T. Mates, D. Okawa, Dr. D. Mair, Dr. S. A. Backer, Dr. S. Rajaram, and Dr. A. Doran for assistance in characterization experiments and insightful discussions.
Fluorocarbon Resist for High-Speed Scanning Probe Lithography†
Article first published online: 14 AUG 2007
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 119, Issue 39, pages 7621–7624, October 1, 2007
How to Cite
Rolandi, M., Suez, I., Scholl, A. and Fréchet, Jean M. J. (2007), Fluorocarbon Resist for High-Speed Scanning Probe Lithography. Angew. Chem., 119: 7621–7624. doi: 10.1002/ange.200701496
- Issue published online: 20 SEP 2007
- Article first published online: 14 AUG 2007
- Manuscript Received: 6 APR 2007
- Director, Office of Science, Office of Basic Energy Sciences, the U.S. Department of Energy. Grant Number: DE-AC02-05CH11231
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