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A Self-Assembly Approach to Chemical Micropatterning of Poly(dimethylsiloxane)

Authors

  • Maaike L. van Poll,

    1. Melville Laboratory for Polymer Synthesis, Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge CB2 1EW, UK, Fax: (+44) 1223-334-866
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  • Feng Zhou Dr.,

    1. Melville Laboratory for Polymer Synthesis, Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge CB2 1EW, UK, Fax: (+44) 1223-334-866
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  • Madeleine Ramstedt Dr.,

    1. Melville Laboratory for Polymer Synthesis, Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge CB2 1EW, UK, Fax: (+44) 1223-334-866
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  • Litian Hu Prof.,

    1. Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China
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  • Wilhelm T. S. Huck Prof.

    1. Melville Laboratory for Polymer Synthesis, Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge CB2 1EW, UK, Fax: (+44) 1223-334-866
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  • We would like to thank Dave Hall at Loughborough University for carrying out the XPS measurements, and AWE (M.L.v.P.) and EPSRC (GR/T11555/01) (F.Z.) for funding.

Abstract

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Bürsten: Die Oberfläche eines Siliconelastomers (Poly(dimethylsiloxan); PDMS) lässt sich selektiv modifizieren, indem die Gibbs-Grenzflächenenergie minimiert wird und sich funktionelle Moleküle auf der Oberfläche selbstorganisieren und dabei die Verteilung der Templat-Oberflächenenergie spiegeln (gezeigt ist die Bildung von POEGMA-Bürsten; SAM=selbstorganisierte Monoschicht, bipy=2,2′-Bipyridyl, POEGMA=Poly[(oligoethylenglycol)methacrylat].

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