The authors thank Prof. Dr. Wolf Widdra and Ralf Kulla, from the Institute of Physics at the Martin Luther University, Halle (Germany), for support on the conception and realization of the ALD tool; Dr. Mato Knetz, from the Max Planck Institute of Microstructure Physics, Halle (Germany), and Prof. Dr. Markku Leskelä, from the Department of Chemistry, University of Helsinki, Finland, for many fruitful discussions; Dr. Dangsheng Su, Achim Klein, and Rosa Arrigo, from the Fritz Haber Institute of the Max Planck Society, Berlin (Germany), for the preparation of the thin-film cross-sections and for supplying the carbon nanotubes; as well as Dr. Frederique Ducroquet, from IMEP-MINATEC, Grenoble, France, for fruitful discussions. Financial support from FCT project N° (PTDC/CTM/65667/2006), FAME network of excellence, and Marie Curie (MEIF-CT2006-041632) is acknowledged.
Non-Aqueous Routes to Metal Oxide Thin Films by Atomic Layer Deposition†
Article first published online: 31 MAR 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 120, Issue 19, pages 3648–3651, April 28, 2008
How to Cite
Rauwel, E., Clavel, G., Willinger, M.-G., Rauwel, P. and Pinna, N. (2008), Non-Aqueous Routes to Metal Oxide Thin Films by Atomic Layer Deposition. Angew. Chem., 120: 3648–3651. doi: 10.1002/ange.200705550
- Issue published online: 21 APR 2008
- Article first published online: 31 MAR 2008
- Manuscript Revised: 4 FEB 2008
- Manuscript Received: 4 DEC 2007
- FCT. Grant Number: PTDC/CTM/65667/2006
- FAME network of excellence
- Marie Curie. Grant Number: MEIF-CT2006-041632
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