C.A.M. acknowledges the AFOSR, DARPA, and NSF for support of this research. C.A.M is also grateful for the NIH Director's Pioneer Award and a NSSEF Fellowship from the DoD.
Topographically Flat, Chemically Patterned PDMS Stamps Made by Dip-Pen Nanolithography†
Article first published online: 14 NOV 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 120, Issue 51, pages 10099–10102, December 8, 2008
How to Cite
Zheng, Z., Jang, J.-W., Zheng, G. and Mirkin, Chad A. (2008), Topographically Flat, Chemically Patterned PDMS Stamps Made by Dip-Pen Nanolithography. Angew. Chem., 120: 10099–10102. doi: 10.1002/ange.200803834
- Issue published online: 3 DEC 2008
- Article first published online: 14 NOV 2008
- Manuscript Received: 4 AUG 2008
Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors.
Please note: Wiley Blackwell is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.