Zuschrift

A New Two-Photon-Sensitive Block Copolymer Nanocarrier†

  1. Jérôme Babin Dr.2,
  2. Maxime Pelletier2,
  3. Martin Lepage Prof. Dr.3,
  4. Jean-François Allard1,
  5. Denis Morris Prof. Dr.1,
  6. Yue Zhao Prof. Dr.2

Article first published online: 2 APR 2009

DOI: 10.1002/ange.200900255

Issue

Angewandte Chemie

Angewandte Chemie

Volume 121, Issue 18, pages 3379–3382, April 20, 2009

Additional Information

How to Cite

Babin, J., Pelletier, M., Lepage, M., Allard, J.-F., Morris, D. and Zhao, Y. (2009), A New Two-Photon-Sensitive Block Copolymer Nanocarrier. Angew. Chem., 121: 3379–3382. doi: 10.1002/ange.200900255

Author Information

  1. 1

    Département de physique, Université de Sherbrooke, Sherbrooke, Québec, J1K2R1 (Canada)

  2. 2

    Département de chimie, Université de Sherbrooke, Sherbrooke, Québec, J1K2R1 (Canada), Fax: (+1) 819-821-8017, http://pages.usherbrooke.ca/yzhao/

  3. 3

    Département de médecine nucléaire et de radiobiologie and Centre d'imagerie moléculaire de Sherbrooke, Université de Sherbrooke, Sherbrooke, Québec, J1K2R1 (Canada)

  1. †

    This work was supported by the Natural Sciences and Engineering Research Council of Canada, le Fonds québécois de la recherche sur la nature et les technologies of Québec via the Centre for Self-Assembled Chemical Structures (CSACS), the Cancer Research Society Inc. (Canada), and St-Jean Photochemicals (Quebec).

Publication History

  1. Issue published online: 15 APR 2009
  2. Article first published online: 2 APR 2009
  3. Manuscript Received: 15 JAN 2009

Funded by

  • Natural Sciences and Engineering Research Council of Canada
  • the Centre for Self-Assembled Chemical Structures (CSACS)
  • Cancer Research Society Inc. (Canada)
  • St-Jean Photochemicals (Quebec)

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