κ is the relative dielectric constant of the material. We thank Steven McDaniel at CFAMM of UCR for assistance in obtaining TEM images. We acknowledge financial support from the NSF (CTS-0404376) and the Semiconductor Research Corporation through collaboration with Intel Corporation.
On-Wafer Crystallization of Ultralow-κ Pure Silica Zeolite Films†
Version of Record online: 22 MAY 2009
Copyright © 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 121, Issue 26, pages 4871–4874, June 15, 2009
How to Cite
Liu, Y., Lew, Christopher M., Sun, M., Cai, R., Wang, J., Kloster, G., Boyanov, B. and Yan, Y. (2009), On-Wafer Crystallization of Ultralow-κ Pure Silica Zeolite Films. Angew. Chem., 121: 4871–4874. doi: 10.1002/ange.200900461
- Issue online: 9 JUN 2009
- Version of Record online: 22 MAY 2009
- Manuscript Received: 23 JAN 2009
- NSF. Grant Number: CTS-0404376
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