This work was partially supported by the National Research Foundation of Korea (NRF) grant (2010-00285, 2012R1A2A1A01003040, and 2009-0094036). I. Song is grateful to Global Ph.D. Fellowship grant from NRF (2012H1A2A1016525). We thank Pohang Accelerator Laboratory (Beamline 8A1).
Patternable Large-Scale Molybdenium Disulfide Atomic Layers Grown by Gold-Assisted Chemical Vapor Deposition†
Article first published online: 13 JAN 2014
Copyright © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 126, Issue 5, pages 1290–1293, January 27, 2014
How to Cite
Song, I., Park, C., Hong, M., Baik, J., Shin, H.-J. and Choi, H. C. (2014), Patternable Large-Scale Molybdenium Disulfide Atomic Layers Grown by Gold-Assisted Chemical Vapor Deposition. Angew. Chem., 126: 1290–1293. doi: 10.1002/ange.201309474
- Issue published online: 23 JAN 2014
- Article first published online: 13 JAN 2014
- Manuscript Received: 31 OCT 2013
- National Research Foundation of Korea (NRF). Grant Numbers: 2010-00285, 2012R1A2A1A01003040, 2009-0094036, 2012H1A2A1016525
- Chemische Dampfabscheidung;
A novel way to grow MoS2 on a large scale with uniformity and in desired patterns is developed. We use Au film as a catalyst on which [Mo(CO)6] vapor decomposes to form a Mo-Au surface alloy that is an ideal Mo reservoir for the growth of atomic layers of MoS2. Upon exposure to H2S, this surface alloy transforms into a few layers of MoS2, which can be isolated and transferred on an arbitrary substrate. By simply patterning Au catalyst film by conventional lithographic techniques, MoS2 atomic layers in desired patterns can be fabricated.