Uniform, Axial-Orientation Alignment of One-Dimensional Single-Crystal Silicon Nanostructure Arrays

Authors

  • Kuiqing Peng Dr.,

    1. Department of Materials Sciences and Engineering, Tsinghua University, Beijing, 100084, China, Fax: (+86) 10-6277-2507
    2. Department of Physics and Materials Science, Center of Super-Diamond and Advanced Films (COSDAF), City University of Hong Kong, Hong Kong SAR, China
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  • Yin Wu,

    1. Department of Materials Sciences and Engineering, Tsinghua University, Beijing, 100084, China, Fax: (+86) 10-6277-2507
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  • Hui Fang,

    1. Department of Materials Sciences and Engineering, Tsinghua University, Beijing, 100084, China, Fax: (+86) 10-6277-2507
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  • Xiaoyan Zhong,

    1. Department of Materials Sciences and Engineering, Tsinghua University, Beijing, 100084, China, Fax: (+86) 10-6277-2507
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  • Ying Xu,

    1. Department of Materials Sciences and Engineering, Tsinghua University, Beijing, 100084, China, Fax: (+86) 10-6277-2507
    2. Institute of Solar Energy Research, Beijing 100084, China
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  • Jing Zhu Prof.

    1. Department of Materials Sciences and Engineering, Tsinghua University, Beijing, 100084, China, Fax: (+86) 10-6277-2507
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  • This work was supported by the National Natural Science Foundation, National 973 Project of the People's Republic of China, and 985 Project of Tsinghua University.

Abstract

original image

Neatly scratching the surface: A facile etching technique assisted by a silver-nanoparticle network to produce large-area 1D silicon nanostructure arrays with desired orientation and doping characteristics is demonstrated (see picture). A mechanism for the highly selective etching is proposed on the basis of experimental evidence.

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