Financial support from the Director, Office of Science, Office of Basic Energy Sciences, the U.S. Department of Energy under contract number DE-AC02-05CH11231, NSF-SINAM, and SRC-DARPA is gratefully acknowledged. M.R. thanks INTEL for postdoctoral funding through the Materials Sciences Division, LBNL. The authors thank Dr. T. Mates, D. Okawa, Dr. D. Mair, Dr. S. A. Backer, Dr. S. Rajaram, and Dr. A. Doran for assistance in characterization experiments and insightful discussions.
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Communication
Fluorocarbon Resist for High-Speed Scanning Probe Lithography†
Article first published online: 14 AUG 2007
DOI: 10.1002/anie.200701496
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Rolandi, M., Suez, I., Scholl, A. and Fréchet, Jean M. J. (2007), Fluorocarbon Resist for High-Speed Scanning Probe Lithography. Angew. Chem. Int. Ed., 46: 7477–7480. doi: 10.1002/anie.200701496
- †
Publication History
- Issue published online: 20 SEP 2007
- Article first published online: 14 AUG 2007
- Manuscript Received: 6 APR 2007
Funded by
- Director, Office of Science, Office of Basic Energy Sciences, the U.S. Department of Energy. Grant Number: DE-AC02-05CH11231
- NSF-SINAM
- SRC-DARPA
- INTEL
Keywords:
- electron microscopy;
- mass spectrometry;
- nanostructures;
- scanning probe lithography;
- surface chemistry
Quick as a flash: High-speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s−1 range. Features as small as 27 nm are fabricated on 100-μm2 areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry.