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Synthesis of Heterometallic Group 13 Nanoclusters and Inks for Oxide Thin-Film Transistors


  • We acknowledge the ARL-ONAMI Nanoarchitectures for Enhanced Performance Center (W911NF-07-2-0083), NSF-IGERT (DGE-0549503), the University of Oregon, and Oregon State University for generous funding of this research. D.W.J. is a Cottrell Scholar of Research Corporation and gratefully acknowledges the National Science Foundation for a CAREER award (CHE-0545206). This work was performed within the Center for Green Materials Chemistry (NSF-0847926)


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Cluster's last stand: The hydrated gallium/indium nanocluster [Ga7In63-OH)6(μ-OH)18(H2O)24(NO3)15] was prepared in a facile, high-yielding synthesis. The use of a key nitroso-containing organic compound as an additive allows for the isolation of multiple grams of the cluster. This larger-scale synthesis facilitates use of the cluster as a single-source precursor for effective thin-film transistors.

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