SEARCH

SEARCH BY CITATION

Keywords:

  • atomic layer deposition;
  • low-temperature techniques;
  • metal nanoparticles;
  • palladium;
  • supported catalysts
Thumbnail image of graphical abstract

Sheltered growth: A novel atomic layer deposition (ALD) method to synthesize highly uniform ultrafine supported metal nanoparticles is described. The ALD process includes growing protected metal nanoparticles and new support layers simultaneously at low temperature. In the final stage, the activation of the metal nanoparticles can be achieved by removing the protective ligands through calcination or reduction at elevated temperature (see picture).