This work was financially supported by Dow Chemical Company under Dow methane challenge project. The ALD system construction was funded by DOE (DE-FG02-03ER15457), AFOSR (MURI F49620-02-1-0381, DURIP FA-9550-07-1-0526), and DTRA JSTO FA9550-06-1-0558. The authors thank Jeffrey W. Elam, Jeffrey T. Miller, Neng Guo and Kathryn M. Kosuda for the technical assistance, and David D. Graf, Lin Luo and Harold H. Kung for the constructive discussions.
Low-Temperature ABC-Type Atomic Layer Deposition: Synthesis of Highly Uniform Ultrafine Supported Metal Nanoparticles†
Version of Record online: 12 MAR 2010
Copyright © 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Angewandte Chemie International Edition
Volume 49, Issue 14, pages 2547–2551, March 29, 2010
How to Cite
Lu, J. and Stair, Peter C. (2010), Low-Temperature ABC-Type Atomic Layer Deposition: Synthesis of Highly Uniform Ultrafine Supported Metal Nanoparticles. Angew. Chem. Int. Ed., 49: 2547–2551. doi: 10.1002/anie.200907168
- Issue online: 23 MAR 2010
- Version of Record online: 12 MAR 2010
- Manuscript Received: 18 DEC 2009
- DOE. Grant Number: DE-FG02-03ER15457
- AFOSR. Grant Numbers: MURI F49620-02-1-0381, DURIP FA-9550-07-1-0526
- DTRA. Grant Number: JSTO FA9550-06-1-0558
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