Electron-Beam-Induced Deposition of Metallic Microstructures from a Molten-Salt Film on Conductive and Nonconductive Substrates

Authors

  • Dr. Vadym Halka,

    1. Karlsruhe Institute of Technology and DFG-Center for Functional Nanostructures, Kaiserstrasse 12, 76131 Karlsruhe (Germany)
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  • Matthias J. Schmid,

    1. Karlsruhe Institute of Technology and DFG-Center for Functional Nanostructures, Kaiserstrasse 12, 76131 Karlsruhe (Germany)
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  • Vsevolod Avrutskiy,

    1. Karlsruhe Institute of Technology and DFG-Center for Functional Nanostructures, Kaiserstrasse 12, 76131 Karlsruhe (Germany)
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  • Xinzhou Ma,

    1. Karlsruhe Institute of Technology and DFG-Center for Functional Nanostructures, Kaiserstrasse 12, 76131 Karlsruhe (Germany)
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  • Prof. Dr. Rolf Schuster

    Corresponding author
    1. Karlsruhe Institute of Technology and DFG-Center for Functional Nanostructures, Kaiserstrasse 12, 76131 Karlsruhe (Germany)
    • Karlsruhe Institute of Technology and DFG-Center for Functional Nanostructures, Kaiserstrasse 12, 76131 Karlsruhe (Germany)
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  • This work was supported by the DFG Center for Functional Nanostructures, which we gratefully acknowledge. We also thank C. Kind and C. Feldmann for support with the elemental analysis of the particles.

Abstract

original image

Microscale checkerboard: A thin liquid electrolyte layer can serve as the precursor for the direct electron-beam-induced deposition of metal on conductive and nonconductive substrates. Mass transport in the film is the key for nucleation and growth of Ag crystallites, which are strongly attached to the substrate surface. The precision of the structures is of the order of the film dimensions (picture: checkerboard pattern of Ag particles on Si).

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