We acknowledge Kurt Broderick at the Microsystem Technology Laboratory, MIT for help with various fabrication processes. We also acknowledge Dr. Seungwoo Lee and Rupak Chakraborty at MIT for the electrochemical setup. This work was financially supported by MIT’s Center for Bits and Atoms, the Chesonis Family Foundation, and an MIT Energy Initiative seed grant. K.J. was supported by the Samsung Scholarship Foundation.
High Photocurrent in Silicon Photoanodes Catalyzed by Iron Oxide Thin Films for Water Oxidation†
Article first published online: 30 NOV 2011
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Angewandte Chemie International Edition
Volume 51, Issue 2, pages 423–427, January 9, 2012
How to Cite
Jun, K., Lee, Y. S., Buonassisi, T. and Jacobson, J. M. (2012), High Photocurrent in Silicon Photoanodes Catalyzed by Iron Oxide Thin Films for Water Oxidation . Angew. Chem. Int. Ed., 51: 423–427. doi: 10.1002/anie.201104367
- Issue published online: 4 JAN 2012
- Article first published online: 30 NOV 2011
- Manuscript Revised: 28 SEP 2011
- Manuscript Received: 23 JUN 2011
- MIT’s Center for Bits and Atoms
- Chesonis Family Foundation
- MIT Energy Initiative seed grant
- Samsung Scholarship Foundation
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