Communication

High Photocurrent in Silicon Photoanodes Catalyzed by Iron Oxide Thin Films for Water Oxidation†

  1. Kimin Jun1,2,
  2. Yun Seog Lee1,
  3. Tonio Buonassisi1,
  4. Prof. Joseph M. Jacobson1,2,*

Article first published online: 30 NOV 2011

DOI: 10.1002/anie.201104367

Issue

Angewandte Chemie International Edition

Angewandte Chemie International Edition

Volume 51, Issue 2, pages 423–427, January 9, 2012

Additional Information

How to Cite

Jun, K., Lee, Y. S., Buonassisi, T. and Jacobson, J. M. (2012), High Photocurrent in Silicon Photoanodes Catalyzed by Iron Oxide Thin Films for Water Oxidation . Angew. Chem. Int. Ed., 51: 423–427. doi: 10.1002/anie.201104367

Author Information

  1. 1

    Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge (USA)

  2. 2

    The Center for Bits and Atoms, Media Laboratory, Massachusetts Institute of Technology, 20 Ames street, E15-413, Cambridge, MA 02139 (USA)

*Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge (USA)

  1. †

    We acknowledge Kurt Broderick at the Microsystem Technology Laboratory, MIT for help with various fabrication processes. We also acknowledge Dr. Seungwoo Lee and Rupak Chakraborty at MIT for the electrochemical setup. This work was financially supported by MIT’s Center for Bits and Atoms, the Chesonis Family Foundation, and an MIT Energy Initiative seed grant. K.J. was supported by the Samsung Scholarship Foundation.

Publication History

  1. Issue published online: 4 JAN 2012
  2. Article first published online: 30 NOV 2011
  3. Manuscript Revised: 28 SEP 2011
  4. Manuscript Received: 23 JUN 2011

Funded by

  • MIT’s Center for Bits and Atoms
  • Chesonis Family Foundation
  • MIT Energy Initiative seed grant
  • Samsung Scholarship Foundation

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