Cover Picture: The Role of Dissociative Electron Attachment in Focused Electron Beam Induced Processing: A Case Study on Cobalt Tricarbonyl Nitrosyl (Angew. Chem. Int. Ed. 40/2011)

Authors

  • Sarah Engmann,

    1. Science Institute and Department of Chemistry, University of Iceland, Dunhagi 3, 107 Reykjavík (Iceland)
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  • Dr. Michal Stano,

    1. Department of Plasma Physics, Comenius University, Mlynska dolina F2, 84248 Bratislava (Slovakia)
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  • Prof. Dr. Štefan Matejčík,

    Corresponding author
    1. Department of Plasma Physics, Comenius University, Mlynska dolina F2, 84248 Bratislava (Slovakia)
    • Department of Plasma Physics, Comenius University, Mlynska dolina F2, 84248 Bratislava (Slovakia)
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  • Prof. Dr. Oddur Ingólfsson

    Corresponding author
    1. Science Institute and Department of Chemistry, University of Iceland, Dunhagi 3, 107 Reykjavík (Iceland)
    • Science Institute and Department of Chemistry, University of Iceland, Dunhagi 3, 107 Reykjavík (Iceland)
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Abstract

original image

Absolute cross-sections for dissociative electron attachment (DEA) to the typical focused electron beam induced processing (FEBIP) precursor cobalt tricarbonyl nitrosyl are reported. Nanostructures written by FEBIP can potentially be smeared and contaminated by back-scattered and secondary low-energy electrons. In their Communication on page 9475 ff. Š. Matejčík, O. Ingólfsson, and co-workers discuss the role of DEA to metal–organic compounds in FEBIP.

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